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Sheet Resistance Mapping with the R54
Filmetrics R-Series resistivity mapping tools combine KLA’s 45-year-old sheet resistance technology with benchtop instrument technology and a user interface honed over the previous 20 years by the Filmetrics team.
The 4PP contact four-point probe configuration is ideal for thin metal and ion implant layers, whereas the non-contact Eddy Current (EC) probe is preferred for thicker metal layers and soft or flexible conductive surfaces. These approaches enable a wide variety of measurements, including but not limited to the following:
Thin film thickness or resistivity
Sheet conductivity
Bulk conductivity
Metal film and backside layer thickness measurements
Substrate resistivity
Sheet resistance
Using rectangular, linear, polar, and custom configurations, the Filmetrics R50 resistivity mapping system is designed to accommodate a wide variety of sample types with enhanced clearance and automated sample point mapping.
The R50 measurement performance is available in a light-tight enclosure with the KLA Instruments™ R54-Series systems, which also have the capacity to support automated X-Y-θ stages for full 200 mm or 300 mm wafer mapping of semiconductor and compound semiconductor wafers.
Models
Source: KLA Instruments™
| Model | Sensor Type | MeasurementRange | MaximumMapDiameter | XY StageRange | MaximumSampleHeight |
|---|---|---|---|---|---|
| R50-4PP | Contact 4PP | 1 mΩ/sq -200 MΩ/sq | 100 mm | 100 mm x100 mm | 100 mm |
| R50-EC | Non-contacteddy current | 1 mΩ/sq -50 Ω/sq | 100 mm | 100 mm x100 mm | 100 mm |
| R50-200-4PP | Contact 4PP | 1 mΩ/sq -200 MΩ/sq | 200 mm | 200 mmround | 100 mm |
| R50-200-EC | Non-contacteddy current | 1 mΩ/sq -50 Ω/sq | 200 mm | 200 mmround | 100 mm |
| R54-200-4PP | Contact 4PP | 1 mΩ/sq -200 MΩ/sq | 200 mm | 200 mm x200 mm | 15 mm |
| R54-200-EC | Non-contacteddy current | 1 mΩ/sq -50 Ω/sq | 200 mm | 200 mm x200 mm | 15 mm |
| R54-300-4PP | Contact 4PP | 1 mΩ/sq -200 MΩ/sq | 300 mm | 300 mmround* | 15 mm |
| R54-300-EC | Non-contacteddy current | 1 mΩ/sq -50 Ω/sq | 300 mm | 300 mmround* | 15 mm |
*Automated X-Y-θ stages
Common Optional Accessories
4PP-TypeA. Image Credit: KLA Instruments™
4PP-TypeB. Image Credit: KLA Instruments™
4PP-TypeC. Image Credit: KLA Instruments™
CondWafer-4PP. Image Credit: KLA Instruments™
Sheet Resistance and Other Measurement Applications
Solar Cells
Flat panel display layers and patterned features
Metal foils
Conductive rubbers & elastomers
Semiconductor wafer substrates
Glass substrates
Plastic (flexible) substrates
PCB patterned features
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