Sheet Resistance Mapping with the R54

Filmetrics R-Series resistivity mapping tools combine KLA’s 45-year-old sheet resistance technology with benchtop instrument technology and a user interface honed over the previous 20 years by the Filmetrics team.

The 4PP contact four-point probe configuration is ideal for thin metal and ion implant layers, whereas the non-contact Eddy Current (EC) probe is preferred for thicker metal layers and soft or flexible conductive surfaces. These approaches enable a wide variety of measurements, including but not limited to the following:

Thin film thickness or resistivity

Sheet conductivity

Bulk conductivity

Metal film and backside layer thickness measurements

Substrate resistivity

Sheet resistance

Using rectangular, linear, polar, and custom configurations, the Filmetrics R50 resistivity mapping system is designed to accommodate a wide variety of sample types with enhanced clearance and automated sample point mapping.

The R50 measurement performance is available in a light-tight enclosure with the KLA Instruments^™ R54-Series systems, which also have the capacity to support automated X-Y-θ stages for full 200 mm or 300 mm wafer mapping of semiconductor and compound semiconductor wafers.

Models

Source: KLA Instruments™

*Automated X-Y-θ stages

Common Optional Accessories

4PP-TypeA. Image Credit: KLA Instruments™

4PP-TypeB. Image Credit: KLA Instruments™

4PP-TypeC. Image Credit: KLA Instruments™

CondWafer-4PP. Image Credit: KLA Instruments™

Sheet Resistance and Other Measurement Applications

Solar Cells

Flat panel display layers and patterned features

Metal foils

Conductive rubbers & elastomers

Semiconductor wafer substrates

Glass substrates

Plastic (flexible) substrates

PCB patterned features